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Antoni Clavé (1913-2005)
Barcelona
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Antoni Clavé started his career when he was barely 13 at the School of Fine Arts in Barcelona. There he studied painting and sculpture with masters of the stature of José Mongrell and Ángel Ferrant. Printing, illustration for advertising and poster art would be the core of his artistic activity at that time, but it would be interrupted in Spain at the end of the Spanish Civil War.

His exile in Paris allowed him to strike up a close friendship with Pablo Picasso, and this immediately resulted in radical changes in his style. Starting with an intimate style of realism, he made successive forays into Expressionism and Cubism, although in the end he would evolve towards Abstraction, a sphere where Picasso was always absent.

Clavé conceives abstract language as a symbolic base of surrealist tradition.
He is particularly interested in textures, which leads him to experiment with all kinds of media and materials. Starting in the 1960s, in a context where informalist ideologies were triumphing, his palette evolved towards an extreme austerity while at the same time Clavé was crossing the limits between artistic genres. His paintings on tapestries, lead sculptures, and assemblages with discarded materials, stand out powerfully in an atmosphere of growing eagerness for innovation, and since the 1970s, all of the great museums of the world understand that their collections are not complete if Antoni Clavé is missing from them.

Without a doubt, we are talking about one of the most outstanding figures of the Spanish Vanguard and one of the most valuable members of what came to be called the Second Spanish School of Paris. His works can be admired at the British Museum, at the Tate Gallery, the Museum of Modern Art in Tokyo and the Queen Sofía Museum in Madrid, among many others. Furthermore, there are many private collectors who compete for his creations at auctions where the bidding goes higher and higher. Antoni Clavé is already one of the most secure values in the Contemporary Art market.